Resources > Grad CRE Notes
These are links to Reactor Lab’s resources for a graduate course in Chemical Reaction Engineering, or CRE. Topics include dynamics of reactions, surface reaction kinetics, reaction and diffusion in porous catalysts, and reaction and diffusion in Chemical Vapor Deposition (CVD).
For links to PDF files, hit the browser back button to return here.
Dynamics of reactions
- see CRE Notes, 15 – CSTR thermal effects, for dynamics of this reactor type
- Pendulum notes – simple mechanical oscillator used as analogy
- Pendulum simulation at our Web Labs (click web browser back button to return here)
- Oregonator oscillating reaction model – description
- Oregonator – waves
- Dynamic reaction-diffusion in a porous catalyst – interactive Web Lab (opens in new tab)
Heterogeneous catalysis
Free online textbook by Lanny Schmidt (link), free from UCSD IP address or through UCSD VPN (link). See especially Chapter 7, Catalytic Reactors and Mass Transfer.
- Adsorption
- Pore size distribution
- Surface reaction kinetics – simple cases – deriving rate equations given a mechanism
- Surface kinetics and SSA – applying the Steady State Approximation
- Surface kinetics – detailed
- Ammonia synthesis mechanism
- Ammonia synthesis kinetics
- Methanol synthesis kinetics >> also see these examples (link) of fitting data using Matlab >> also see Resources, CRE Notes, 13-A – methanol reactor model
- Reaction and diffusion in porous catalysts
- Diffusion resistance in methanol synthesis catalyst pellets
- Dynamic reaction-diffusion in a porous catalyst – research paper (opens in new tab)
- Dynamic reaction-diffusion in a porous catalyst – interactive Web Lab (opens in new tab)
- Non-uniformly active catalysts
- Effectiveness factors greater than one
- Mass transfer coefficients in packed beds
Chemical Vapor Deposition (CVD)
- Intro to CVD – general overview in photos
- Thermal oxidation of Si wafers
- Simplest model of LPCVD wafer-stack reactor
- LPCVD of polysilicon in wafer-stack tube reactor
- Boundary layer solutions
- Reaction and boundary layer solution
- CVD reactor with wafer setback and slant
- CVD stagnant film notes
- Dimensionless groups and their meaning
- Characteristic values of some transport properties, boundary layer thicknesses, etc.
Discussion of Komiyama, et al. (1999). Link to the paper on Science Direct, free from UCSD IP address or through UCSD VPN (link).
- Comparison to 2D model of CVD, file CVD_Komiyama_2D_model.pdf
- Comparison to 1D model of CVD, file CVD_Komiyama_1D_model.pdf
- Step coverage and determination of sticking coefficients, file Komiyama_trench.pdf